Corn growers looking for longer-lasting control of hard-to-manage broadleaf weeds and grasses now have a new tool. DuPont Realm Q herbicide has received federal registration approval from the U.S. Environmental Protection Agency for postemergence use on corn.
"Realm Q delivers more control under more conditions, making it an excellent choice for managing weeds that reduce yield and profitability," said John Chrosniak, regional director, North America – DuPont Crop Protection. "This is another example of how DuPont is developing products to meet growers' changing needs, including the increasingly important need to manage weed resistance."
Realm Q gives growers more control of their weed programs by delivering contact plus residual control and multiple modes of action to manage both glyphosate- and ALS-resistant weeds. Applied early postemergence, Realm Q tackles the weeds that are already in the field on contact, then keeps working to conquer later-emerging weeds, including waterhemp.
As the newest member of the DuPont Q Product Formulations portfolio, Realm Q includes built-in safener technology, so corn growers can apply it under more diverse weather conditions, across more hybrids and with a wider range of adjuvants.
Realm Q is available in a convenient dry formulation for easy mixing and application. Effective at low use rates, Realm Q is applied at only 4 ounces per acre.
Realm Q is available with grower financing through the TruChoice Opportunity Program plus other purchase incentives that will allow a grower to earn up to an 8 percent incentive on all DuPont Crop Protection product purchases.DuPont (www.dupont.com) is a science-based products and services company. Founded in 1802, DuPont puts science to work by creating sustainable solutions essential to a better, safer, healthier life for people everywhere. Operating in more than 90 countries, DuPont offers a wide range of innovative products and services for markets including agriculture and food; building and construction; communications; and transportation.